Penyediaan dan pencirian C54 TiSi2 untuk proses Silisida litar bersepadu CMOS /
Saved in:
Main Author: | Uda Hashim |
---|---|
Format: | Thesis Book |
Language: | Malay |
Published: |
Bangi :
Fakulti Kejuruteraan, Universiti Kebangsaan Malaysia,
2001
|
Subjects: | |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Process integration issues of self-aligned titanium silicide technology (Ti-Salicide) in deep sub-micron CMOS devices fabrication /
by: Lim, Chong Wee
Published: (1998) -
Development of an effective algorithm for microchip lead inspection /
by: Obaidy, Haitham Hilmi Lutfi
Published: (2004) -
Integration of self-aligned silicide (salicide) process for sub-0.25 [mu]m CMOS technology /
by: Ho, Chaw Sing
Published: (2002) -
Modeling and analysis of semiconductor back-end assembly process /
by: Joseph, Neethamol
Published: (1998) -
Enhanced stability of nickel silicide for advanced CMOS silicon technologies /
by: Lee, Pooi See
Published: (2001)