Simulation of Planar and Finfet Transistor Model for Digital Gate Applications / Siti Aishah Abu Salim
In this work, FinFET (dual-gate) transistor is simulated using computer added design (CAD) tools to replace the conventional planar MOSFET. Nowadays planar transistors are no longer clean due to current leakage during on-off switches. Thus, these effects have caused some heat and power issues. FinFE...
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my-uitm-ir.1026922024-11-18T02:44:29Z Simulation of Planar and Finfet Transistor Model for Digital Gate Applications / Siti Aishah Abu Salim 2013 Abu Salim, Siti Aishah Apparatus and materials In this work, FinFET (dual-gate) transistor is simulated using computer added design (CAD) tools to replace the conventional planar MOSFET. Nowadays planar transistors are no longer clean due to current leakage during on-off switches. Thus, these effects have caused some heat and power issues. FinFET transistors offer superior performance as the device is scaled into the nanometer. Therefore, the ON current was investigated by analyzing the I-V characteristic. Also the gate sizing was investigated and the results have shown the differences in their performances. In addition, the SPICE models of 32 nm were employed for inverter, NAND and NOR gates and the results were verified by DC and AC analysis. The results indicate that FinFET circuits have better performance and produced less leakage when compared to planar MOSFET. 2013 Thesis https://ir.uitm.edu.my/id/eprint/102692/ https://ir.uitm.edu.my/id/eprint/102692/1/102692.pdf text en public degree Universiti Teknologi MARA (UiTM) Faculty of Electrical Engineering Sulaiman, Suhana |
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Universiti Teknologi MARA |
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UiTM Institutional Repository |
language |
English |
advisor |
Sulaiman, Suhana |
topic |
Apparatus and materials |
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Apparatus and materials Abu Salim, Siti Aishah Simulation of Planar and Finfet Transistor Model for Digital Gate Applications / Siti Aishah Abu Salim |
description |
In this work, FinFET (dual-gate) transistor is simulated using computer added design (CAD) tools to replace the conventional planar MOSFET. Nowadays planar transistors are no longer clean due to current leakage during on-off switches. Thus, these effects have caused some heat and power issues. FinFET transistors offer superior performance as the device is scaled into the nanometer. Therefore, the ON current was investigated by analyzing the I-V characteristic. Also the gate sizing was investigated and the results have shown the differences in their performances. In addition, the SPICE models of 32 nm were employed for inverter, NAND and NOR gates and the results were verified by DC and AC analysis. The results indicate that FinFET circuits have better performance and produced less leakage when compared to planar MOSFET. |
format |
Thesis |
qualification_level |
Bachelor degree |
author |
Abu Salim, Siti Aishah |
author_facet |
Abu Salim, Siti Aishah |
author_sort |
Abu Salim, Siti Aishah |
title |
Simulation of Planar and Finfet Transistor Model for Digital Gate Applications / Siti Aishah Abu Salim |
title_short |
Simulation of Planar and Finfet Transistor Model for Digital Gate Applications / Siti Aishah Abu Salim |
title_full |
Simulation of Planar and Finfet Transistor Model for Digital Gate Applications / Siti Aishah Abu Salim |
title_fullStr |
Simulation of Planar and Finfet Transistor Model for Digital Gate Applications / Siti Aishah Abu Salim |
title_full_unstemmed |
Simulation of Planar and Finfet Transistor Model for Digital Gate Applications / Siti Aishah Abu Salim |
title_sort |
simulation of planar and finfet transistor model for digital gate applications / siti aishah abu salim |
granting_institution |
Universiti Teknologi MARA (UiTM) |
granting_department |
Faculty of Electrical Engineering |
publishDate |
2013 |
url |
https://ir.uitm.edu.my/id/eprint/102692/1/102692.pdf |
_version_ |
1818588046198571008 |