Measurement of dielectric constant of silicon wafer using microwave non-destrictive testing and direct current technique / Nadia Md Kamal

This paper presents comparison between measurement of dielectric constant of silicon wafer by using MNDT which is at high frequency and by using HIOKI 3532-50 LCR HiTESTER which at low frequency. Measurement of dielectric properties of silicon wafer at microwave frequencies is performed in free spac...

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محفوظ في:
التفاصيل البيبلوغرافية
المؤلف الرئيسي: Md Kamal, Nadia
التنسيق: أطروحة
اللغة:English
منشور في: 2010
الموضوعات:
الوصول للمادة أونلاين:https://ir.uitm.edu.my/id/eprint/81107/1/81107.pdf
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spelling my-uitm-ir.811072024-07-28T08:26:13Z Measurement of dielectric constant of silicon wafer using microwave non-destrictive testing and direct current technique / Nadia Md Kamal 2010 Md Kamal, Nadia Microwaves. Including microwave circuits This paper presents comparison between measurement of dielectric constant of silicon wafer by using MNDT which is at high frequency and by using HIOKI 3532-50 LCR HiTESTER which at low frequency. Measurement of dielectric properties of silicon wafer at microwave frequencies is performed in free space using a pair of spotfocusing horn lens antennas, mode transitions, coaxial cable and vector network analyser (VNA). A contactless and non-destructive microwave method has been developed to characterize silicon semiconductor wafer from reflection and transmission measurement made in free space at normal incident. In this method, the free-space reflection and transmission coefficients, S11 and S21 are measured for silicon wafer sandwiched between two teflon plates which are quarter-wavelength at mid-band. The actual reflection and transmission coefficient, S11 and S21 of the silicon wafers are calculated from the measured S 11 and S21 of the teflon plate-silicon waferteflon plate assembly in which the complex permittivity and thickness of the teflon plates are known. Result for p-type and n-type doped silicon wafer are reported in frequency range of l 0GHz to 12GHz. As a comparison, a measurement at low frequency using DC method has been conducted. The frequency range is reported from 0.2 kHz to 50 kHz. 2010 Thesis https://ir.uitm.edu.my/id/eprint/81107/ https://ir.uitm.edu.my/id/eprint/81107/1/81107.pdf text en public degree Universiti Teknologi MARA (UiTM) Faculty of Electrical Engineering Naim, Nani Fadzlina
institution Universiti Teknologi MARA
collection UiTM Institutional Repository
language English
advisor Naim, Nani Fadzlina
topic Microwaves
Including microwave circuits
spellingShingle Microwaves
Including microwave circuits
Md Kamal, Nadia
Measurement of dielectric constant of silicon wafer using microwave non-destrictive testing and direct current technique / Nadia Md Kamal
description This paper presents comparison between measurement of dielectric constant of silicon wafer by using MNDT which is at high frequency and by using HIOKI 3532-50 LCR HiTESTER which at low frequency. Measurement of dielectric properties of silicon wafer at microwave frequencies is performed in free space using a pair of spotfocusing horn lens antennas, mode transitions, coaxial cable and vector network analyser (VNA). A contactless and non-destructive microwave method has been developed to characterize silicon semiconductor wafer from reflection and transmission measurement made in free space at normal incident. In this method, the free-space reflection and transmission coefficients, S11 and S21 are measured for silicon wafer sandwiched between two teflon plates which are quarter-wavelength at mid-band. The actual reflection and transmission coefficient, S11 and S21 of the silicon wafers are calculated from the measured S 11 and S21 of the teflon plate-silicon waferteflon plate assembly in which the complex permittivity and thickness of the teflon plates are known. Result for p-type and n-type doped silicon wafer are reported in frequency range of l 0GHz to 12GHz. As a comparison, a measurement at low frequency using DC method has been conducted. The frequency range is reported from 0.2 kHz to 50 kHz.
format Thesis
qualification_level Bachelor degree
author Md Kamal, Nadia
author_facet Md Kamal, Nadia
author_sort Md Kamal, Nadia
title Measurement of dielectric constant of silicon wafer using microwave non-destrictive testing and direct current technique / Nadia Md Kamal
title_short Measurement of dielectric constant of silicon wafer using microwave non-destrictive testing and direct current technique / Nadia Md Kamal
title_full Measurement of dielectric constant of silicon wafer using microwave non-destrictive testing and direct current technique / Nadia Md Kamal
title_fullStr Measurement of dielectric constant of silicon wafer using microwave non-destrictive testing and direct current technique / Nadia Md Kamal
title_full_unstemmed Measurement of dielectric constant of silicon wafer using microwave non-destrictive testing and direct current technique / Nadia Md Kamal
title_sort measurement of dielectric constant of silicon wafer using microwave non-destrictive testing and direct current technique / nadia md kamal
granting_institution Universiti Teknologi MARA (UiTM)
granting_department Faculty of Electrical Engineering
publishDate 2010
url https://ir.uitm.edu.my/id/eprint/81107/1/81107.pdf
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