Formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [TN1-997].

Lapisan nipis ZrO2 untuk aplikasi get dielektrik telah dibentuk di atas substrat Si dan SiC dengan menggunakan kombinasi proses pemercitan logam dan pengoksidaan haba. ZrO2 thin films for gate dielectric application has been formed on Si and SiC substrates using a combination of metal sputtering...

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Main Author:	Tedi, Kurniawan
Format:	Thesis
Language:	English
Published:	2009
Subjects:	TN1-997 Mining engineering Metallurgy
Online Access:	http://eprints.usm.my/15537/1/FORMATION_OF_ZrO2_THIN_FILMS.pdf
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id	my-usm-ep.15537
record_format	uketd_dc
spelling	my-usm-ep.155372017-05-15T08:05:02Z Formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [TN1-997]. 2009-08 Tedi, Kurniawan TN1-997 Mining engineering. Metallurgy Lapisan nipis ZrO2 untuk aplikasi get dielektrik telah dibentuk di atas substrat Si dan SiC dengan menggunakan kombinasi proses pemercitan logam dan pengoksidaan haba. ZrO2 thin films for gate dielectric application has been formed on Si and SiC substrates using a combination of metal sputtering and thermal oxidation process. 2009-08 Thesis http://eprints.usm.my/15537/ http://eprints.usm.my/15537/1/FORMATION_OF_ZrO2_THIN_FILMS.pdf application/pdf en public masters Universiti Sains Malaysia Pusat Pengajian Kejuruteraan Bahan dan Sumber Mineral
institution	Universiti Sains Malaysia
collection	USM Institutional Repository
language	English
topic	TN1-997 Mining engineering Metallurgy
spellingShingle	TN1-997 Mining engineering Metallurgy Tedi, Kurniawan Formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [TN1-997].
description	Lapisan nipis ZrO2 untuk aplikasi get dielektrik telah dibentuk di atas substrat Si dan SiC dengan menggunakan kombinasi proses pemercitan logam dan pengoksidaan haba. ZrO2 thin films for gate dielectric application has been formed on Si and SiC substrates using a combination of metal sputtering and thermal oxidation process.
format	Thesis
qualification_level	Master's degree
author	Tedi, Kurniawan
author_facet	Tedi, Kurniawan
author_sort	Tedi, Kurniawan
title	Formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [TN1-997].
title_short	Formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [TN1-997].
title_full	Formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [TN1-997].
title_fullStr	Formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [TN1-997].
title_full_unstemmed	Formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [TN1-997].
title_sort	formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [tn1-997].
granting_institution	Universiti Sains Malaysia
granting_department	Pusat Pengajian Kejuruteraan Bahan dan Sumber Mineral
publishDate	2009
url	http://eprints.usm.my/15537/1/FORMATION_OF_ZrO2_THIN_FILMS.pdf
_version_	1747819869803380736

Formation of zro2 thin films by thermal oxidation of sputtered zr on si and sic substrates [TN1-997].

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