Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study
Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. Perkembangan pesat dalam bidang industri semikonduktor kini telah memerangsangkan teknik untuk mengoptimumkan penggunaan mesin-mesin dengan efektif s...
Saved in:
Main Author: | |
---|---|
Format: | Thesis |
Language: | English |
Published: |
2008
|
Subjects: | |
Online Access: | http://eprints.usm.my/31210/1/SIOW_YUEN_TIEN.pdf |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
id |
my-usm-ep.31210 |
---|---|
record_format |
uketd_dc |
spelling |
my-usm-ep.312102017-04-17T09:26:35Z Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study 2008-11 Siow, Yuen Tien TJ1 Mechanical engineering and machinery Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. Perkembangan pesat dalam bidang industri semikonduktor kini telah memerangsangkan teknik untuk mengoptimumkan penggunaan mesin-mesin dengan efektif setelah membelanjakan beribu juta dalam perlaburan. Tanpa penggunaan perisian komputer yang canggih dalam analisis, adalah sukar untuk menggunakan teknik purba dalam analisis pengiraan apabila menghadapi perkembangan produk yang semakin tinggi teknologinya. Dalam kajian ini, satu model simulasi telah dibina untuk menganalisis masa mendulu dalam alatan photolithography melalui teknik yang lebih sistematik dan efektif. Model simulasi ini telah dibina berasaskan perisian computer yang memerlukan informasi yang teliti seperti mas a memproses dan juga aliran proses dalam alatan photolithography. The industry of semiconductor wafer fabrication ("fab") has invested a huge amount of capital on the manufacturing equipments particular in photolithography area which has driven the needs to re-look at the most profitable way of utilizing and operating them efficiently. Traditional industrial engineering analysis techniques through mathematical models or static models for the studies of photolithography process are simply not adequate to analyze these complex environments. In this research, a more realistic representation of photolithography tools that can give a better prediction results and a more systematic methodology for minimizing photolithography cycle time is presented. The proposed method is to reduce waiting time and increase utilization of the photolithography process, which would result in an overall equipment cycle time reduction. 2008-11 Thesis http://eprints.usm.my/31210/ http://eprints.usm.my/31210/1/SIOW_YUEN_TIEN.pdf application/pdf en public masters Universiti Sains Malaysia Pusat Pengajian Kejuruteraan Mekanikal |
institution |
Universiti Sains Malaysia |
collection |
USM Institutional Repository |
language |
English |
topic |
TJ1 Mechanical engineering and machinery |
spellingShingle |
TJ1 Mechanical engineering and machinery Siow, Yuen Tien Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study |
description |
Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan
kos pelaburan yang tinggi terutamanya dalam alatan photolithography. Perkembangan pesat
dalam bidang industri semikonduktor kini telah memerangsangkan teknik untuk
mengoptimumkan penggunaan mesin-mesin dengan efektif setelah membelanjakan beribu
juta dalam perlaburan. Tanpa penggunaan perisian komputer yang canggih dalam analisis,
adalah sukar untuk menggunakan teknik purba dalam analisis pengiraan apabila menghadapi
perkembangan produk yang semakin tinggi teknologinya. Dalam kajian ini, satu model
simulasi telah dibina untuk menganalisis masa mendulu dalam alatan photolithography
melalui teknik yang lebih sistematik dan efektif. Model simulasi ini telah dibina berasaskan
perisian computer yang memerlukan informasi yang teliti seperti mas a memproses dan juga
aliran proses dalam alatan photolithography.
The industry of semiconductor wafer fabrication ("fab") has invested a huge amount
of capital on the manufacturing equipments particular in photolithography area which has
driven the needs to re-look at the most profitable way of utilizing and operating them
efficiently. Traditional industrial engineering analysis techniques through mathematical
models or static models for the studies of photolithography process are simply not adequate
to analyze these complex environments. In this research, a more realistic representation of
photolithography tools that can give a better prediction results and a more systematic
methodology for minimizing photolithography cycle time is presented. The proposed method
is to reduce waiting time and increase utilization of the photolithography process, which
would result in an overall equipment cycle time reduction. |
format |
Thesis |
qualification_level |
Master's degree |
author |
Siow, Yuen Tien |
author_facet |
Siow, Yuen Tien |
author_sort |
Siow, Yuen Tien |
title |
Cycle Time Analysis For Photolithography Tools In
Semiconductor Manufacturing Industry With Simulation
Model: A Case Study
|
title_short |
Cycle Time Analysis For Photolithography Tools In
Semiconductor Manufacturing Industry With Simulation
Model: A Case Study
|
title_full |
Cycle Time Analysis For Photolithography Tools In
Semiconductor Manufacturing Industry With Simulation
Model: A Case Study
|
title_fullStr |
Cycle Time Analysis For Photolithography Tools In
Semiconductor Manufacturing Industry With Simulation
Model: A Case Study
|
title_full_unstemmed |
Cycle Time Analysis For Photolithography Tools In
Semiconductor Manufacturing Industry With Simulation
Model: A Case Study
|
title_sort |
cycle time analysis for photolithography tools in
semiconductor manufacturing industry with simulation
model: a case study |
granting_institution |
Universiti Sains Malaysia |
granting_department |
Pusat Pengajian Kejuruteraan Mekanikal |
publishDate |
2008 |
url |
http://eprints.usm.my/31210/1/SIOW_YUEN_TIEN.pdf |
_version_ |
1747820404118913024 |