Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment

Thin film Zr on Si and SiC were formed by sputtering. The films then underwent simultaneous oxidation and nitridation in N2O. The effects of oxidation/nitridation durations (5 20 min) and temperatures (500 1100oC) on the sputtered Zr/Si system and the effects of oxidation/nitridation temperatures (...

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Main Author:	Wong, Yew Hoong
Format:	Thesis
Language:	English
Published:	2012
Subjects:	TN1-997 Mining engineering Metallurgy
Online Access:	http://eprints.usm.my/44927/1/WONG%20YEW%20HOONG.pdf
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id	my-usm-ep.44927
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spelling	my-usm-ep.449272019-07-09T06:50:01Z Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment 2012-05 Wong, Yew Hoong TN1-997 Mining engineering. Metallurgy Thin film Zr on Si and SiC were formed by sputtering. The films then underwent simultaneous oxidation and nitridation in N2O. The effects of oxidation/nitridation durations (5 20 min) and temperatures (500 1100oC) on the sputtered Zr/Si system and the effects of oxidation/nitridation temperatures (400 900oC) and the concentrations of N2O (10 100%) to the characteristics of the sputtered Zr/SiC system were studied. Structural, chemical, and electrical properties of the samples were examined. X-ray photoelectron spectroscopy results showed that ZrO2 thin film was formed with an interfacial layer (IL) of Zr-silicate oxynitride (ZrSiON) on Si, while Zr-oxynitride (ZrON) thin film was formed with an IL of ZrSiON and carbon nitride on SiC. 2012-05 Thesis http://eprints.usm.my/44927/ http://eprints.usm.my/44927/1/WONG%20YEW%20HOONG.pdf application/pdf en public phd doctoral Universiti Sains Malaysia Pusat Pengajian Kejuteraan Bahan & Sumber Mineral
institution	Universiti Sains Malaysia
collection	USM Institutional Repository
language	English
topic	TN1-997 Mining engineering Metallurgy
spellingShingle	TN1-997 Mining engineering Metallurgy Wong, Yew Hoong Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment
description	Thin film Zr on Si and SiC were formed by sputtering. The films then underwent simultaneous oxidation and nitridation in N2O. The effects of oxidation/nitridation durations (5 20 min) and temperatures (500 1100oC) on the sputtered Zr/Si system and the effects of oxidation/nitridation temperatures (400 900oC) and the concentrations of N2O (10 100%) to the characteristics of the sputtered Zr/SiC system were studied. Structural, chemical, and electrical properties of the samples were examined. X-ray photoelectron spectroscopy results showed that ZrO2 thin film was formed with an interfacial layer (IL) of Zr-silicate oxynitride (ZrSiON) on Si, while Zr-oxynitride (ZrON) thin film was formed with an IL of ZrSiON and carbon nitride on SiC.
format	Thesis
qualification_name	Doctor of Philosophy (PhD.)
qualification_level	Doctorate
author	Wong, Yew Hoong
author_facet	Wong, Yew Hoong
author_sort	Wong, Yew Hoong
title	Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment
title_short	Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment
title_full	Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment
title_fullStr	Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment
title_full_unstemmed	Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment
title_sort	investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment
granting_institution	Universiti Sains Malaysia
granting_department	Pusat Pengajian Kejuteraan Bahan & Sumber Mineral
publishDate	2012
url	http://eprints.usm.my/44927/1/WONG%20YEW%20HOONG.pdf
_version_	1747821426775162880

Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment

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