Technique of failure analysis for gate oxide defect of Bi-polar CMOS Diffuse (BCD) technology

This research presents failure analysis (FA) works on gate oxide defect of Bi�polar CMOS Diffuse (BCD) technology. The latent problem with electrical degradation in the CMOS performance is due to gate oxide defect. The defect was well known affects the CMOS reliability after certain period of ti...

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主要作者: Abdullah, Farisal
格式: Thesis
语言:English
English
English
出版: 2013
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在线阅读:http://eprints.uthm.edu.my/1902/1/24p%20FARISAL%20ABDULLAH.pdf
http://eprints.uthm.edu.my/1902/2/FARISAL%20ABDULLAH%20COPYRIGHT%20DECLARATION.pdf
http://eprints.uthm.edu.my/1902/3/FARISAL%20ABDULLAH%20WATERMARK.pdf
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