Optical properties measurements of nanocrystalline silicon thin films

Nanocrystalline silicon (nc-Si) thin films on 7059 corning glass substrate were prepared using Very High Frequency Plasma-Enhanced Chemical Vapour Deposition (VHF-PECVD) at different deposition temperatures. The nc-Si properties film were analyzed using spectroscopic ellipsometer, ultra violet (UV-V...

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Main Author:	Gan, Chee Hong
Format:	Thesis
Language:	English
Published:	2011
Subjects:	Q Science (General)
Online Access:	http://eprints.utm.my/id/eprint/33381/1/GanCheeHongMFS2011.pdf
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spelling	my-utm-ep.333812021-05-27T05:16:36Z Optical properties measurements of nanocrystalline silicon thin films 2011 Gan, Chee Hong Q Science (General) Nanocrystalline silicon (nc-Si) thin films on 7059 corning glass substrate were prepared using Very High Frequency Plasma-Enhanced Chemical Vapour Deposition (VHF-PECVD) at different deposition temperatures. The nc-Si properties film were analyzed using spectroscopic ellipsometer, ultra violet (UV-VIS) spectrophotometer and luminescence spectrometer (PL). The thickness and optical constants of the films were investigated as a function of deposition temperature (Td) as Td increased the thickness and refractive index increased whereas the extinction coefficient decreased. Based on the transmission spectra, the nc-Si films found to have transmission percentage above 40% for the red visible spectrum wavelength. The photoluminiscence spectra of nc-Si films excited at 498 nm showed a single peak in the range of 1.84-1.95 eV (636-675 nm) and excited at 388 nm also showed a single peak in the range of 2.15-2.30 eV (539-579 nm). Both of these peaks were at energy higher than the band gap energy (Eband) obtained by using Tauc plot method which was around 1.7-1.8 eV. The peak energy was found to be shifted as Td changes. It was found that the decrease in Td acts to increase the values of Eband and the PL peaks showed red shift. 2011 Thesis http://eprints.utm.my/id/eprint/33381/ http://eprints.utm.my/id/eprint/33381/1/GanCheeHongMFS2011.pdf application/pdf en public http://dms.library.utm.my:8080/vital/access/manager/Repository/vital:70042?queryType=vitalDismax&query=Optical+properties+measurements+of+nanocrystalline+silicon+thin+films&public=true masters Universiti Teknologi Malaysia, Faculty of Science Faculty of Science
institution	Universiti Teknologi Malaysia
collection	UTM Institutional Repository
language	English
topic	Q Science (General)
spellingShingle	Q Science (General) Gan, Chee Hong Optical properties measurements of nanocrystalline silicon thin films
description	Nanocrystalline silicon (nc-Si) thin films on 7059 corning glass substrate were prepared using Very High Frequency Plasma-Enhanced Chemical Vapour Deposition (VHF-PECVD) at different deposition temperatures. The nc-Si properties film were analyzed using spectroscopic ellipsometer, ultra violet (UV-VIS) spectrophotometer and luminescence spectrometer (PL). The thickness and optical constants of the films were investigated as a function of deposition temperature (Td) as Td increased the thickness and refractive index increased whereas the extinction coefficient decreased. Based on the transmission spectra, the nc-Si films found to have transmission percentage above 40% for the red visible spectrum wavelength. The photoluminiscence spectra of nc-Si films excited at 498 nm showed a single peak in the range of 1.84-1.95 eV (636-675 nm) and excited at 388 nm also showed a single peak in the range of 2.15-2.30 eV (539-579 nm). Both of these peaks were at energy higher than the band gap energy (Eband) obtained by using Tauc plot method which was around 1.7-1.8 eV. The peak energy was found to be shifted as Td changes. It was found that the decrease in Td acts to increase the values of Eband and the PL peaks showed red shift.
format	Thesis
qualification_level	Master's degree
author	Gan, Chee Hong
author_facet	Gan, Chee Hong
author_sort	Gan, Chee Hong
title	Optical properties measurements of nanocrystalline silicon thin films
title_short	Optical properties measurements of nanocrystalline silicon thin films
title_full	Optical properties measurements of nanocrystalline silicon thin films
title_fullStr	Optical properties measurements of nanocrystalline silicon thin films
title_full_unstemmed	Optical properties measurements of nanocrystalline silicon thin films
title_sort	optical properties measurements of nanocrystalline silicon thin films
granting_institution	Universiti Teknologi Malaysia, Faculty of Science
granting_department	Faculty of Science
publishDate	2011
url	http://eprints.utm.my/id/eprint/33381/1/GanCheeHongMFS2011.pdf
_version_	1747816147408912384

Optical properties measurements of nanocrystalline silicon thin films

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