Structure, morphology and wettability properties of carbon nitride nanostructures deposited by plasma enhanced chemical vapour deposition technique /

مواد مشابهة

• Plasma enhanced chemical vapour deposition of carbon nitride films from ethane and nitrogen gas mixtures /
  بواسطة: Maisara Othman
  منشور في: (2012)
• Amorphous silicon (a-Si:H)/silicon nitride (a-SiNx:H) superlattice by D.C. plasma enhanced chemical vapour deposition : preparation and characterization /
  بواسطة: Mitani, Sufian Mousa Ibrahim
  منشور في: (2004)
• Hydrogenated amorphous silicon by pulsed plasma enhanced chemical vapour deposition technique /
  بواسطة: Goh, Boon Tong
  منشور في: (2005)
• Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films /
  بواسطة: Aniszawati Azis
  منشور في: (2012)
• Hot-filament plasma enhanced chemical vapour deposition of transfer-free graphene using nickel catalyst /
  بواسطة: Maisara Othman
  منشور في: (2019)