Formation of ZrO2 gate dielectric on Ge substrate by thermal oxidation and post annealing for metal-oxide-semiconductor devices /

Formation of ZrO2 gate dielectric on Ge substrate by thermal oxidation and post annealing for metal-oxide-semiconductor devices /

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書目詳細資料
主要作者:	Lei, Zhen Ce (Author)
格式:	Thesis 圖書
語言:	English
出版:	2019.
主題:	Metal oxide semiconductors. Metals > Thermal conductivity. Metals > Oxidation. Germanium. Zirconium. Sputtering (Physics) Annealing of metals.
在線閱讀:	http://studentsrepo.um.edu.my/11120/
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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