The influence of a layer of oxide on electromigration performance of Al/Cu/Si metal lines /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
1995.
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| LEADER | 00887cam a2200253 a 4500 | ||
|---|---|---|---|
| 001 | u400676 | ||
| 003 | SIRSI | ||
| 008 | 960810s1995 si v 00 1 eng m | ||
| 035 | |a ACA-8774 | ||
| 040 | |a UMM | ||
| 090 | |a TK7871.85 |b Koh | ||
| 100 | 1 | 0 | |a Koh, David Khar Ann. |
| 245 | 1 | 4 | |a The influence of a layer of oxide on electromigration performance of Al/Cu/Si metal lines / |c by Koh Khar Ann, David. |
| 260 | |c 1995. | ||
| 300 | |a xvii, 123 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Eng.) -- National University of Singapore, 1995. | ||
| 504 | |a Bibliography: leaves 118-123. | ||
| 650 | 0 | |a Electrodiffusion | |
| 650 | 0 | |a Metal oxide semiconductors. | |
| 650 | 0 | |a Integrated circuits |x Very large scale integration. | |
| 650 | 0 | |a Metallic films. | |
| 948 | |a 10/08/1996 |b 17/08/1998 | ||
| 596 | |a 1 | ||
| 999 | |a TK7871.85 KOH |w LC |c 1 |i A506132545 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 30/9/1996 | ||