Growth of the transition metal silicides films from single source precursors by MOCVD /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
1998.
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| Subjects: | |
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| LEADER | 00778cam a2200241 a 4500 | ||
|---|---|---|---|
| 001 | u433829 | ||
| 003 | SIRSI | ||
| 008 | 990105s1998 si v 00 1 eng m | ||
| 035 | |a ACG-4142 | ||
| 040 | |a UMM | ||
| 090 | |a QD181 |b S6Luo | ||
| 100 | 1 | 0 | |a Luo, Lan. |
| 245 | 1 | 0 | |a Growth of the transition metal silicides films from single source precursors by MOCVD / |c by Luo Lan. |
| 260 | |c 1998. | ||
| 300 | |a ix, 153 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Sc.) -- National University of Singapore, 1998. | ||
| 504 | |a Bibliography: leaves 152-153. | ||
| 650 | 0 | |a Silicides | |
| 650 | 0 | |a Metallic films. | |
| 650 | 0 | |a Chemical vapor deposition. | |
| 948 | |a 05/01/1999 |b 14/04/1999 | ||
| 596 | |a 1 | ||
| 999 | |a QD181 S6LUO |w LC |c 1 |i A508374236 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 22/4/1999 | ||