Electrical and structural characterisation of rapid thermal annealed RF sputtered silicon oxide films /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
1998.
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| LEADER | 00885cam a2200253 a 4500 | ||
|---|---|---|---|
| 001 | u436985 | ||
| 003 | SIRSI | ||
| 008 | 970429s1998 si v 00 1 eng m | ||
| 035 | |a ACG-8401 | ||
| 040 | |a UMM | ||
| 090 | |a TK7871.15 |b F5Han | ||
| 100 | 1 | 0 | |a Han, King Kwang. |
| 245 | 1 | 0 | |a Electrical and structural characterisation of rapid thermal annealed RF sputtered silicon oxide films / |c by Han King Kwang. |
| 260 | |c 1998. | ||
| 300 | |a xvi, 136 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Eng.) -- National University of Singapore, 1998. | ||
| 504 | |a Includes bibliographical references. | ||
| 650 | 0 | |a Silicon oxide films. | |
| 650 | 0 | |a Silicon |x Electric properties. | |
| 650 | 0 | |a Semiconductor films. | |
| 650 | 0 | |a Rapid thermal processing. | |
| 948 | |a 23/03/1999 |b 14/12/2001 | ||
| 596 | |a 1 | ||
| 999 | |a TK7871.15 F5HAN |w LC |c 1 |i A508383404 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 3/6/1999 | ||