Synthesis and characterization of RF-PECVD carbon nitride thin films /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
1999.
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| Subjects: | |
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| LEADER | 00796cam a2200241 a 4500 | ||
|---|---|---|---|
| 001 | u450418 | ||
| 003 | SIRSI | ||
| 008 | 991117s1999 si v 00 eng | ||
| 035 | |a ACI-7679 | ||
| 040 | |a UMM | ||
| 090 | |a QD271.4 |b Lim | ||
| 100 | 1 | 0 | |a Lim, Shuang Fang. |
| 245 | 1 | 0 | |a Synthesis and characterization of RF-PECVD carbon nitride thin films / |c Lim Shuang Fang. |
| 260 | |c 1999. | ||
| 300 | |a 106 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Sc.) -- National University of Singapore, 1999. | ||
| 504 | |a Includes bibliographical references. | ||
| 650 | 0 | |a Carbon compounds. | |
| 650 | 0 | |a Plasma-enhanced chemical vapor deposition. | |
| 650 | 0 | |a Thin films. | |
| 948 | |a 24/01/2000 |b 24/07/2000 | ||
| 596 | |a 1 | ||
| 999 | |a QD271.4 LIM |w LC |c 1 |i A509450204 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 2/8/2000 | ||