Plasma charge damage in submicron process /
محفوظ في:
| المؤلف الرئيسي: | |
|---|---|
| التنسيق: | أطروحة كتاب |
| اللغة: | English |
| منشور في: |
1999.
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| الموضوعات: | |
| الوسوم: |
إضافة وسم
لا توجد وسوم, كن أول من يضع وسما على هذه التسجيلة!
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| LEADER | 00790cam a2200241 a 4500 | ||
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| 001 | u451886 | ||
| 003 | SIRSI | ||
| 008 | 000224s1999 si v 00 1 eng m | ||
| 035 | |a ACI-9971 | ||
| 040 | |a UMM | ||
| 090 | |a TK7871.85 |b Son | ||
| 100 | 1 | 0 | |a Song, Jun. |
| 245 | 1 | 0 | |a Plasma charge damage in submicron process / |c by Song Jun. |
| 260 | |c 1999. | ||
| 300 | |a xxi, 101 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Eng.) -- National University of Singapore, 1999. | ||
| 504 | |a Bibliography: leaves 95-96. | ||
| 650 | 0 | |a Semiconductors |x Effect of radiation of. | |
| 650 | 0 | |a Plasma etching |x Industrial applications | |
| 650 | 0 | |a Semiconductors |x Etching | |
| 948 | |a 26/02/2000 |b 16/05/2000 | ||
| 596 | |a 1 | ||
| 999 | |a TK7871.85 SON |w LC |c 1 |i A509511684 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 1/6/2000 | ||