Liu, L. (1999). Thermal behavior of tantalum-based diffusion barriers in Cu/Si metallization.
Chicago Style (17th ed.) CitationLiu, Ling. Thermal Behavior of Tantalum-based Diffusion Barriers in Cu/Si Metallization. 1999.
MLA (8th ed.) CitationLiu, Ling. Thermal Behavior of Tantalum-based Diffusion Barriers in Cu/Si Metallization. 1999.
Warning: These citations may not always be 100% accurate.