Comparison of Ta2O5 capacitors on Si with and without rapid thermal nitridation /
Saved in:
主要作者: | Zhang, Guangyu |
---|---|
格式: | Thesis 图书 |
语言: | English |
出版: |
1999.
|
标签: |
添加标签
没有标签, 成为第一个标记此记录!
|
相似书籍
-
The application of rapid thermal annealing to reduce leakage current of Ta2O5 /
由: Qian, Pengwei
出版: (1999) -
Investigation on thermo-physical properties and thermal-hydraulic performance of TiO2-SiO2 nanofluids
由: Muhammad Nabil Fikri, Mohamad
出版: (2018) -
Development Of SiO2 On 4H-SiC By Direct Thermal Oxidation And Post Oxidation Annealing In HNO3 & H2O Vapour
由: Banu , Poobalan
出版: (2014) -
Cathodoluminescence from SiO2-Si structures /
由: Liu, Xu
出版: (1996) -
Al-Ta2O5-GaN
Semiconductor Device Structure
由: Yeoh, Lai Seng
出版: (2014)