PLD fabrication techniques and characteristics of nitride and oxide thin films /:
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2000.
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| LEADER | 00710nam a2200205 a 4500 | ||
|---|---|---|---|
| 001 | u506356 | ||
| 003 | SIRSI | ||
| 008 | 021112s2000 si a v 00 10 eng m | ||
| 035 | |a ACW-2682 | ||
| 040 | |a UMM | ||
| 090 | |a QC3 |b NUS 2000 Chu | ||
| 100 | 1 | 0 | |a Chu, Chen. |
| 245 | 1 | 0 | |a PLD fabrication techniques and characteristics of nitride and oxide thin films /: |c Chu Chen. |
| 260 | |c 2000. | ||
| 300 | |a v, 98 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Sc.) -- National University of Singapore, 2000. | ||
| 504 | |a Includes bibliographical references. | ||
| 948 | |a 12/11/2002 |b 12/11/2002 | ||
| 596 | |a 1 | ||
| 999 | |a QC3 NUS 2000 CHU |w LC |c 1 |i A510552708 |l B_KOM4 |m P01UTAMA |r Y |s Y |t TESIS |u 3/12/2002 |o .PUBLIC. BKOM 4 : 44075 | ||