Nickel silicide integration issues in SI deep sub-micron technologies /

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Bibliographic Details
Main Author: Tan, Wee Leng
Format: Thesis Book
Language:English
Published: 2001.
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245 1 0 |a Nickel silicide integration issues in SI deep sub-micron technologies /  |c Tan Wee Leng. 
260 |c 2001. 
300 |a x, 109 leaves :  |b ill. ;  |c 30 cm. 
502 |a Dissertation (M.Eng.) -- National University of Singapore, 2001. 
504 |a Bibliography: leaves 102-108. 
948 |a 18/11/2002  |b 18/11/2002 
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