Characterisation of Ta2O5 thin films for sub-0.25 um applications /

مواد مشابهة

• Characterisation of Ta2O5 thin films for sub-0.25um applications /
  بواسطة: Tay, Mark Gek Leng
  منشور في: (2000)
• Integration of Cu interconnects for sub-0.25 um manufacturing /
  بواسطة: Yap, Kuan Pei
  منشور في: (1999)
• From chelating precursors to La0.05Sr0.95CoO3-Y oxide powders and thin films /
  بواسطة: Guo, Feng
  منشور في: (1999)
• Photoresist trimming technique in high-density oxygen-based plasmas for sub-0.1 um mosfet fabrication using 248-nm lithography /
  بواسطة: Sin, Chian Yuh
  منشور في: (2002)
• Fabrication and characterization of Ag/Pd metallized La0.2Sr0.8C0O3-0 ceramic electrolyte membrance /
  بواسطة: Liu, Yuanyuan
  منشور في: (2003)