Effect of X-ray lithography on MOS device reliability /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2001.
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| Subjects: | |
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| LEADER | 00787nam a2200241 a 4500 | ||
|---|---|---|---|
| 001 | u507223 | ||
| 003 | SIRSI | ||
| 008 | 020917s2001 si a v 00 10 eng m | ||
| 035 | |a ACW-5689 | ||
| 040 | |a UMM | ||
| 090 | |a TA7 |b NUS 2001 Kim | ||
| 100 | 1 | 0 | |a Kim, Sun Jung |
| 245 | 1 | 0 | |a Effect of X-ray lithography on MOS device reliability / |c Kim Sun Jung. |
| 260 | |c 2001. | ||
| 300 | |a xiii, 93 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Eng.) -- National University of Singapore, 2001. | ||
| 504 | |a Bibliography: leaves 79-93. | ||
| 650 | 0 | |a X-ray lithography. | |
| 650 | 0 | |a Metal oxide semiconductors. | |
| 900 | |a NHS | ||
| 948 | |a 03/12/2002 |b 03/12/2002 | ||
| 596 | |a 1 | ||
| 999 | |a TA7 NUS 2001 KIM |w LC |c 1 |i A510652627 |l B_KOM4 |m P01UTAMA |r Y |s Y |t TESIS |u 17/12/2002 |o .PUBLIC. BKOM 4 : 44711 | ||