Zhang, H. (2002). Study on the corrosion behavior of tungsten and titanium in post-etch strippers commonly used in semiconductor manufacturing.
Chicago Style (17th ed.) CitationZhang, Hao. Study on the Corrosion Behavior of Tungsten and Titanium in Post-etch Strippers Commonly Used in Semiconductor Manufacturing. 2002.
MLA引文Zhang, Hao. Study on the Corrosion Behavior of Tungsten and Titanium in Post-etch Strippers Commonly Used in Semiconductor Manufacturing. 2002.
警告:这些引文格式不一定是100%准确.