Zhang, H. (2002). Study on the corrosion behavior of tungsten and titanium in post-etch strippers commonly used in semiconductor manufacturing.
Chicago Style (17th ed.) CitationZhang, Hao. Study on the Corrosion Behavior of Tungsten and Titanium in Post-etch Strippers Commonly Used in Semiconductor Manufacturing. 2002.
MLA (8th ed.) CitationZhang, Hao. Study on the Corrosion Behavior of Tungsten and Titanium in Post-etch Strippers Commonly Used in Semiconductor Manufacturing. 2002.
Warning: These citations may not always be 100% accurate.