Lek, C. M. (2002). Development of ultra-thin nitrogen-rich gate oxide process for deep submicron CMOS technology.
Chicago Style (17th ed.) CitationLek, Chun Meng. Development of Ultra-thin Nitrogen-rich Gate Oxide Process for Deep Submicron CMOS Technology. 2002.
MLA引文Lek, Chun Meng. Development of Ultra-thin Nitrogen-rich Gate Oxide Process for Deep Submicron CMOS Technology. 2002.
警告:這些引文格式不一定是100%准確.