Photoresist trimming technique in high-density oxygen-based plasmas for sub-0.1 um mosfet fabrication using 248-nm lithography /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2002.
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| Subjects: | |
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| Physical Description: | xiii, 103 leaves : ill. ; 30 cm. |
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| Bibliography: | Bibliography: leaves 98-120. |