Photoresist trimming technique in high-density oxygen-based plasmas for sub-0.1 um mosfet fabrication using 248-nm lithography /

مواد مشابهة

• Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor
• Fault tolerance of L1 data cache memory induced by intrinsic parameters fluctuation in sub 10nm UTB-SOI MOSFETs
  بواسطة: Ahmed, Rabah Abood
  منشور في: (2013)
• Simulation of 0.1um Mos devices for logic and memory technologies /
  بواسطة: Poh, Francis Yong Wee
  منشور في: (2002)
• Study on alignment capability and overlay performance in back-end of line lithography process for 130nm technology /
  بواسطة: Lau, Siau Yen
• Integration of Cu interconnects for sub-0.25 um manufacturing /
  بواسطة: Yap, Kuan Pei
  منشور في: (1999)