Chong, D. K. S. (2002). Study of plasma induced charging damage at CMOS gate process.
Chicago Style (17th ed.) CitationChong, Daniel Kien Seen. Study of Plasma Induced Charging Damage at CMOS Gate Process. 2002.
MLA引文Chong, Daniel Kien Seen. Study of Plasma Induced Charging Damage at CMOS Gate Process. 2002.
警告:這些引文格式不一定是100%准確.