APA引文

Xu, Y. (2002). Computer simulation of silicon nitride deposition in PECVD reactors using SiCl4/NH3/Ar mixtures as precursors.

Chicago Style (17th ed.) Citation

Xu, Yunhua. Computer Simulation of Silicon Nitride Deposition in PECVD Reactors Using SiCl4/NH3/Ar Mixtures as Precursors. 2002.

MLA引文

Xu, Yunhua. Computer Simulation of Silicon Nitride Deposition in PECVD Reactors Using SiCl4/NH3/Ar Mixtures as Precursors. 2002.

警告：这些引文格式不一定是100％准确.