Enhanced stability of nickel silicide for advanced CMOS silicon technologies /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2001.
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| Subjects: | |
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| LEADER | 00867cam a2200229 a 4500 | ||
|---|---|---|---|
| 001 | u691868 | ||
| 003 | SIRSI | ||
| 008 | 020917s2001 si a v 00 10 eng m | ||
| 035 | |a ACW-2405 | ||
| 040 | |a UMM | ||
| 090 | |a TA404.2 |b NUSP 2001 Lee | ||
| 100 | 1 | 0 | |a Lee, Pooi See. |
| 245 | 1 | 0 | |a Enhanced stability of nickel silicide for advanced CMOS silicon technologies / |c Lee Pooi See. |
| 260 | |c 2001. | ||
| 300 | |a xvi, 244 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Thesis (Ph.D.) -- Dept. of Materials Science, Faculty of Science, National University of Singapore, 2001. | ||
| 504 | |a Includes bibliographical references. | ||
| 650 | 0 | |a Metal oxide semiconductors, Complementary. | |
| 650 | 0 | |a Silicides |x Stability. | |
| 948 | |a 09/11/2002 |b 10/08/2004 | ||
| 596 | |a 1 | ||
| 999 | |a TA404.2 NUSP 2001 LEE |w LC |c 1 |i A510948728 |d 24/8/2006 |f 24/8/2006 |g 1 |l B_KOM4 |m P01UTAMA |r Y |s Y |t TESIS |u 14/2/2005 | ||