Latent damage generation in silicon dioxide under high-field impulse and constant-bias stressing /
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Main Author: | |
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Format: | Thesis Book |
Language: | English |
Published: |
2001.
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LEADER | 00933cam a2200229 a 4500 | ||
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001 | u692078 | ||
003 | SIRSI | ||
008 | 021126s2001 si a v 00 10 eng m | ||
035 | |a ACW-4843 | ||
040 | |a UMM | ||
090 | |a TK7 |b NUSP 2001 Lim | ||
100 | 1 | 0 | |a Lim, Peng Soon. |
245 | 1 | 0 | |a Latent damage generation in silicon dioxide under high-field impulse and constant-bias stressing / |c Lim Peng Soon. |
260 | |c 2001. | ||
300 | |a xxvi, 173 leaves : |b ill. ; |c 30 cm. | ||
502 | |a Thesis (Ph.D.) -- Dept. of Electrical & Computer Engineering, Faculty of Engineering, National University of Singapore, 2001. | ||
504 | |a Includes bibliographical references. | ||
650 | 0 | |a Silica. | |
650 | 0 | |a Metal oxide semiconductor field-effect transistors |x Reliability | |
948 | |a 26/11/2002 |b 26/08/2004 | ||
596 | |a 1 | ||
999 | |a TK7 NUSP 2001 LIM |w LC |c 1 |i A510653108 |d 17/7/2006 |f 17/7/2006 |g 1 |l B_KOM4 |m P01UTAMA |r Y |s Y |t TESIS |u 14/2/2005 |o .PUBLIC. BKOM 4 :43105 |