Plasma process-induced damage to oxide/nitride/oxide (ONO) interpoly dielectric in flash memory devices /

Plasma process-induced damage to oxide/nitride/oxide (ONO) interpoly dielectric in flash memory devices /

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书目详细资料
主要作者:	Cha, Cher Liang
格式:	Thesis 图书
语言:	English
出版:	2001.
主题:	Plasma devices > Defects. Ferroelectric storage cells.
标签:	添加标签没有标签, 成为第一个标记此记录!

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