APA引文

Ho, C. S. (2002). Integration of self-aligned silicide (salicide) process for sub-0.25 [mu]m CMOS technology.

Chicago Style (17th ed.) Citation

Ho, Chaw Sing. Integration of Self-aligned Silicide (salicide) Process for Sub-0.25 [mu]m CMOS Technology. 2002.

MLA引文

Ho, Chaw Sing. Integration of Self-aligned Silicide (salicide) Process for Sub-0.25 [mu]m CMOS Technology. 2002.

警告：这些引文格式不一定是100％准确.