Integration of self-aligned silicide (salicide) process for sub-0.25 [mu]m CMOS technology /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2002.
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| Subjects: | |
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| Item Description: | [mu] is represents with Greek alphabet. |
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| Physical Description: | xxiv, [140] leaves : ill. ; 30 cm. |
| Bibliography: | Bibliography: leaves 123-136. |