Integration of self-aligned silicide (salicide) process for sub-0.25 [mu]m CMOS technology /
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| 主要作者: | |
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| 格式: | Thesis 图书 |
| 语言: | English |
| 出版: |
2002.
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| 主题: | |
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| Item Description: | [mu] is represents with Greek alphabet. |
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| 实物描述: | xxiv, [140] leaves : ill. ; 30 cm. |
| 参考书目: | Bibliography: leaves 123-136. |