Amorphous silicon (a-Si:H)/silicon nitride (a-SiNx:H) superlattice by D.C. plasma enhanced chemical vapour deposition : preparation and characterization /

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Bibliographic Details
Main Author: Mitani, Sufian Mousa Ibrahim
Format: Thesis Book
Language:English
Published: 2004.
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LEADER 01037cam a2200253 a 4500
001 u725731
003 SIRSI
005 200608081448
008 060808s2004 my t 000 0 eng m
040 |a UMM 
090 |a QC3  |b UMP 2004 Mit 
100 1 0 |a Mitani, Sufian Mousa Ibrahim 
245 1 0 |a Amorphous silicon (a-Si:H)/silicon nitride (a-SiNx:H) superlattice by D.C. plasma enhanced chemical vapour deposition :  |b preparation and characterization /  |c by Sufian Mousa Ibrahim Mitani. 
260 |c 2004. 
300 |a xix, 248 leaves :  |b ill. ;  |c 30 cm. 
500 |a Supervised by Prof. Dr. Saadah A. Rahman. 
502 |a Thesis (Ph.D.) -- Jabatan Fizik, Fakulti Sains, Universiti Malaya, 2005. 
504 |a Bibliography: leaves 201-202. 
650 0 |a Amorphous semiconductors. 
650 0 |a Plasma-enhanced chemical vapor deposition. 
650 0 |a Silicon nitride. 
710 2 0 |a Universiti Malaya.  |b Jabatan Fizik. 
596 |a 1 
999 |a QC3 UMP 2004 MIT  |w LC  |c 1  |i A511939745  |d 22/8/2006  |f 22/8/2006  |g 1  |l STACKS  |m P01UTAMA  |r Y  |s Y  |t TESIS  |u 22/8/2006