Time & temperature optimization for iron-boron pair (Fe-B) dissociation in silicon wafers by surface photovoltage (SPV) method /
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| 主要作者: | |
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| 格式: | Thesis 圖書 |
| 語言: | English |
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2006.
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| 003 | SIRSI | ||
| 005 | 200704061605 | ||
| 008 | 070406s2006 my a t 000 0 eng m | ||
| 040 | |a UMM |d UMJ | ||
| 090 | |a TS176 |b UM 2006 Pha | ||
| 097 | |a TS176 |b UM 2006 Pha | ||
| 100 | 1 | |a Phang, Siew Wei. | |
| 245 | 1 | 0 | |a Time & temperature optimization for iron-boron pair (Fe-B) dissociation in silicon wafers by surface photovoltage (SPV) method / |c Phang Siew Wei. |
| 246 | |a Time and temperature optimization for iron-boron pair (Fe-B) dissociation in silicon wafers | ||
| 260 | |c 2006. | ||
| 300 | |a ix, 67, A4, B4, C43 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Eng.) -- Jabatan Kejuruteraan Rekabentuk dan Pembuatan, Fakulti Kejuruteraan, Universiti Malaya, 2007. | ||
| 504 | |a Bibliography: leaves 65-67. | ||
| 650 | 0 | |a Silicon |x Heat treatment. | |
| 650 | 0 | |a Iron |x Heating. | |
| 710 | 2 | |a Universiti Malaya. |b Jabatan Kejuruteraan Rekabentuk dan Pembuatan. | |
| 596 | |a 1 7 | ||
| 900 | |a SJMK | ||
| 999 | |a TS176 UM 2006 PHA |w LC |c 1 |i A512900079 |d 3/12/2007 |f 3/12/2007 |g 1 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 27/11/2007 | ||
| 999 | |a TS176 UM 2006 PHA |w LC |c 1 |i A513003895 |d 18/8/2008 |f 18/8/2008 |g 1 |l STACKS |m P07JURUTER |r Y |s Y |t TESIS |u 15/8/2008 | ||