A study of stress in backend metallization in ULSI devices /

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Bibliographic Details
Main Author: Goh, Chia Lan
Format: Thesis Book
Language:English
Published: 2006.
Subjects:
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245 1 2 |a A study of stress in backend metallization in ULSI devices /  |c Goh Chia Lan. 
260 |c 2006. 
300 |a xvii, 75 leaves :  |b ill. ;  |c 30 cm. 
502 |a Dissertation (M.Eng.) -- Jabatan Kejuruteraan Mekanik, Fakulti Kejuruteraan, Universiti Malaya, 2006. 
504 |a Bibliography: leaves 72-75. 
650 0 |a Integrated circuits  |x Ultra large scale integration. 
650 0 |a Strains and stresses. 
710 2 |a Universiti Malaya.  |b Jabatan Kejuruteraan Mekanik. 
900 |a HF 
596 |a 1 
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