Study on alignment capability and overlay performance in back-end of line lithography process for 130nm technology /
Saved in:
| Main Author: | |
|---|---|
| Format: | Thesis Book |
| Language: | English |
| Subjects: | |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| LEADER | 01115cam a2200265 a 4500 | ||
|---|---|---|---|
| 001 | u747345 | ||
| 003 | SIRSI | ||
| 005 | 200710231553 | ||
| 008 | 070925s2007 my a t 000 0 eng m | ||
| 040 | |a UMM |d UMJ | ||
| 090 | |a TA145 |b UM 2007 Lau | ||
| 097 | |a TA145 |b UM 2007 Lau | ||
| 100 | 1 | |a Lau, Siau Yen. | |
| 245 | 1 | 0 | |a Study on alignment capability and overlay performance in back-end of line lithography process for 130nm technology / |c Lau Siau Yen. |
| 300 | |a xx, 127 leaves : |b ill. (some col.) ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Eng.Sc.) -- Jabatan Kejuruteraan Awam, Fakulti Kejuruteraan, Universiti Malaya, 2007. | ||
| 504 | |a Bibliography: leaves 108-112. | ||
| 650 | 0 | |a Photolithography. | |
| 650 | 0 | |a Semiconductor wafers. | |
| 650 | 0 | |a Image registration. | |
| 710 | 2 | |a Universiti Malaya. |b Jabatan Kejuruteraan Awam. | |
| 900 | |a SJMK | ||
| 596 | |a 1 7 | ||
| 999 | |a TA145 UM 2007 LAU |w LC |c 1 |i A513118271 |d 27/5/2015 |e 27/5/2015 |f 18/12/2007 |g 1 |l STACKS |m P01UTAMA |n 1 |r Y |s Y |t TESIS |u 18/12/2007 | ||
| 999 | |a TA145 UM 2007 LAU |w LC |c 1 |i A513003037 |d 18/8/2008 |f 18/8/2008 |g 1 |l STACKS |m P07JURUTER |r Y |s Y |t TESIS |u 14/8/2008 | ||