Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2008.
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| Subjects: | |
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| Physical Description: | xviii, 191 leaves : ill. ; 30 cm. |
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| Bibliography: | Bibliography: leaves 184-191. |