Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2008.
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| LEADER | 00934cam a2200241 a 4500 | ||
|---|---|---|---|
| 001 | u764665 | ||
| 003 | SIRSI | ||
| 005 | 200901291306 | ||
| 008 | 090129s2008 my a t 000 0 eng m | ||
| 040 | |a UMM | ||
| 090 | |a QC3 |b UM 2008 Shi | ||
| 100 | 1 | |a Shi, Chee Han. | |
| 245 | 1 | 0 | |a Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition / |c Shi Chee Han. |
| 260 | |c 2008. | ||
| 300 | |a xviii, 191 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Sc.) -- Jabatan Fizik, Fakulti Sains, Universiti Malaya, 2008. | ||
| 504 | |a Bibliography: leaves 184-191. | ||
| 650 | 0 | |a Plasma frequencies. | |
| 650 | 0 | |a Thin films. | |
| 710 | 2 | |a Universiti Malaya. |b Jabatan Fizik. | |
| 900 | |a ZSA-ZA | ||
| 596 | |a 1 | ||
| 999 | |a QC3 UM 2008 SHI |w LC |c 1 |i A513444868 |d 12/10/2009 |f 12/10/2009 |g 1 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 12/10/2009 | ||