Ng, K. H. (2008). Development of a planar coil radio frequency inductively coupled plasma system for material processing.
Chicago Style (17th ed.) CitationNg, Kim Hooi. Development of a Planar Coil Radio Frequency Inductively Coupled Plasma System for Material Processing. 2008.
MLA引文Ng, Kim Hooi. Development of a Planar Coil Radio Frequency Inductively Coupled Plasma System for Material Processing. 2008.
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