Inductively coupled plasma dry etching process on planar lightwave circuit fabrication /
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Main Author: | |
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Format: | Thesis Book |
Language: | English |
Published: |
2010.
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Subjects: | |
Online Access: | http://studentsrepo.um.edu.my/id/eprint/4273 |
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001 | u796879 | ||
003 | SIRSI | ||
005 | 201009090925 | ||
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040 | |a UMM |d AUM |e rda | ||
090 | |a QC3 |b UM 2010 Chu | ||
100 | 1 | |a Chuah, Khoon Seah. | |
245 | 1 | 0 | |a Inductively coupled plasma dry etching process on planar lightwave circuit fabrication / |c Chuah Khoon Seah. |
260 | |c 2010. | ||
300 | |a x, 199 leaves : |b ill. ; |c 30 cm. | ||
502 | |a Dissertation (M.Sc.) -- Jabatan Fizik, Fakulti Sains, Universiti Malaya, 2010. | ||
650 | 0 | |a Plasma etching. | |
650 | 0 | |a Photonics. | |
650 | 0 | |a Wave guides. | |
650 | 0 | |a Optical fibers. | |
650 | 0 | |a Lithography. | |
650 | 0 | |a Photolithography. | |
710 | 2 | |a Universiti Malaya. |b Jabatan Fizik. | |
856 | 4 | 1 | |u http://studentsrepo.um.edu.my/id/eprint/4273 |
900 | |a ZSA-ZA | ||
596 | |a 1 25 | ||
999 | |a QC3 UM 2010 CHU |w LC |c 1 |i A514477235 |d 17/3/2011 |f 17/3/2011 |g 1 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 16/3/2011 | ||
999 | |a QC3 UM 2010 CHU |w LC |c 1 |i A514477213 |f 12/10/2021 |g 1 |l STACKS |m P25UMARCHI |r N |s Y |t CD |u 29/7/2015 |1 STEM |