Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films /
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| Main Author: | |
|---|---|
| Format: | Thesis Book |
| Language: | English |
| Published: |
2012.
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| Subjects: | |
| Online Access: | http://studentsrepo.um.edu.my/id/eprint/3841 |
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| 001 | u871297 | ||
| 003 | SIRSI | ||
| 005 | 201301031236 | ||
| 008 | 130103s2012 my a t 000 0 eng m | ||
| 040 | |a UMM |d AUM |e rda | ||
| 090 | |a Q180 |b UMP 2012 Ania | ||
| 100 | 0 | |a Aniszawati Azis. | |
| 245 | 1 | 0 | |a Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films / |c Aniszawati binti Azis. |
| 260 | |c 2012. | ||
| 300 | |a xvi, 155 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Thesis (Ph.D) -- Institut Pengajian Siswazah, Universiti Malaya, 2012. | ||
| 504 | |a Bibliography: leaves 128-135. | ||
| 530 | |a Also issued in CD. | ||
| 650 | 0 | |a Silicon-carbide thin films. | |
| 650 | 0 | |a Plasma-enhanced chemical vapor deposition. | |
| 650 | 0 | |a Chemical vapor deposition. | |
| 710 | 2 | |a Universiti Malaya. |b Institut Pengajian Siswazah. | |
| 856 | 4 | 1 | |u http://studentsrepo.um.edu.my/id/eprint/3841 |
| 900 | |a AT-ZA | ||
| 596 | |a 1 25 | ||
| 999 | |a Q180 UMP 2012 ANIA |w LC |c 1 |i A515369011 |d 3/7/2013 |f 3/7/2013 |g 1 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 2/7/2013 | ||
| 999 | |a Q180 UMP 2012 ANIA |w LC |c 1 |i A515366390 |l STACKS |m P25UMARCHI |r Y |s Y |t CD |u 10/7/2015 |1 STEM | ||