Properties of amorphous carbon thin films for solar cell application / Norhafizan Mohd Hanib

This thesis is presented the research on properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (Thermal-CVD) method at various deposition temperatures. The surface morpholo...

وصف كامل

محفوظ في:
التفاصيل البيبلوغرافية
المؤلف الرئيسي: Mohd Hanib, Norhafizan
التنسيق: أطروحة
اللغة:English
منشور في: 2007
الموضوعات:
الوصول للمادة أونلاين:https://ir.uitm.edu.my/id/eprint/102923/1/102923.pdf
الوسوم: إضافة وسم
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الوصف
الملخص:This thesis is presented the research on properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (Thermal-CVD) method at various deposition temperatures. The surface morphology and electrical properties of these films have been studied using Scanning Electron Mircoscope (SEM) and Current Voltage (I-V) Measurement (Advantest R6243 DC Voltage Current Source/Monitor Software), respectively. It was found that increasing deposition temperature had the most influence on the a-C thin films properties. In addition the carrier gas flow and catalyst concentration both showed a secondary impact on the properties of a-C thin films. The resistivity of a-C thin films decreases when the deposition temperature increases. However, at higher deposition temperature the conductivity increases due to the formation of more disorder sp carbon site.