Thermal-mechanical analysis of bonding pad in insulated gate bipolar transistor

In development of the die stacking interconnection technology, the thermal analysis on stacked dies are commonly engaged in semiconductor products. However, thermal issues are not the main criteria for stack die configuration and thus the combined effects of thermal and mechanical stresses are ov...

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spelling my-unimap-774292022-12-07T02:03:55Z Thermal-mechanical analysis of bonding pad in insulated gate bipolar transistor Vithyacharan, Retnasamy, Dr. In development of the die stacking interconnection technology, the thermal analysis on stacked dies are commonly engaged in semiconductor products. However, thermal issues are not the main criteria for stack die configuration and thus the combined effects of thermal and mechanical stresses are overlooked during the design of the stacked dies. As there are existence of multiple dies and other materials with different Coefficient of Thermal Expansion (CTE), thermo-mechanical loading and its effect on reliability needs to be studied for optimum the interconnection design and die configuration. The focus in this thesis is a) thermal-mechanical analysis on the wirebond interconnection of stacked die by using element analysis, b) the study of planar bonding of stacked die to improve of interconnection. The investigation is carried by modelling an Insulated-Gate Bipolar Transistor (IGBT) with wirebonds based on an investigation carried out Dudek et al. 2015. This model serves as a basis for comparison. The model undergoes cyclic heating and cooling with a temperature delta of 150K and the stress experienced by the model at the bonding interface between Wirebond and Baseplate is recorded at the of each heating and cooling cycles. The test is repeated using a model IGBT with the wirebond replaced with a planar bond, and the stress results are compared. The results of the thermal modelling matches the model by Dudek et al, showing the viability of the model. Thermomechanical analysis shows stress in the interconnection between wirebond and baseplate is highest at the edges of the interconnection and is the same for the planar bond. The results of the analysis show that the stresses in a stacked die are highest at low temperature. The planar bonding method offers a marked improvement over the wirebond in terms of interconnection stress and thus is a viable for improving the thermo-mechanical stresses in a stacked die. Universiti Malaysia Perlis (UniMAP) Thesis en http://dspace.unimap.edu.my:80/xmlui/handle/123456789/77429 http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/77429/4/license.txt 8a4605be74aa9ea9d79846c1fba20a33 http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/77429/1/Page%201-24.pdf fc3b68ecd931f57884d2533f295a838d http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/77429/2/Full%20text.pdf dc5c404b8d66e9d61054670c88ab69c3 http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/77429/3/Declaration%20Form.pdf 4323f9911872d7ea7db5e1d73f72749c Universiti Malaysia Perlis (UniMAP) Insulated gate bipolar transistors Bipolar transistors Wire bonding (Electronic packaging) Planar transistors School of Microelectronic Engineering
institution Universiti Malaysia Perlis
collection UniMAP Institutional Repository
language English
advisor Vithyacharan, Retnasamy, Dr.
topic Insulated gate bipolar transistors
Bipolar transistors
Wire bonding (Electronic packaging)
Planar transistors
spellingShingle Insulated gate bipolar transistors
Bipolar transistors
Wire bonding (Electronic packaging)
Planar transistors
Thermal-mechanical analysis of bonding pad in insulated gate bipolar transistor
description In development of the die stacking interconnection technology, the thermal analysis on stacked dies are commonly engaged in semiconductor products. However, thermal issues are not the main criteria for stack die configuration and thus the combined effects of thermal and mechanical stresses are overlooked during the design of the stacked dies. As there are existence of multiple dies and other materials with different Coefficient of Thermal Expansion (CTE), thermo-mechanical loading and its effect on reliability needs to be studied for optimum the interconnection design and die configuration. The focus in this thesis is a) thermal-mechanical analysis on the wirebond interconnection of stacked die by using element analysis, b) the study of planar bonding of stacked die to improve of interconnection. The investigation is carried by modelling an Insulated-Gate Bipolar Transistor (IGBT) with wirebonds based on an investigation carried out Dudek et al. 2015. This model serves as a basis for comparison. The model undergoes cyclic heating and cooling with a temperature delta of 150K and the stress experienced by the model at the bonding interface between Wirebond and Baseplate is recorded at the of each heating and cooling cycles. The test is repeated using a model IGBT with the wirebond replaced with a planar bond, and the stress results are compared. The results of the thermal modelling matches the model by Dudek et al, showing the viability of the model. Thermomechanical analysis shows stress in the interconnection between wirebond and baseplate is highest at the edges of the interconnection and is the same for the planar bond. The results of the analysis show that the stresses in a stacked die are highest at low temperature. The planar bonding method offers a marked improvement over the wirebond in terms of interconnection stress and thus is a viable for improving the thermo-mechanical stresses in a stacked die.
format Thesis
title Thermal-mechanical analysis of bonding pad in insulated gate bipolar transistor
title_short Thermal-mechanical analysis of bonding pad in insulated gate bipolar transistor
title_full Thermal-mechanical analysis of bonding pad in insulated gate bipolar transistor
title_fullStr Thermal-mechanical analysis of bonding pad in insulated gate bipolar transistor
title_full_unstemmed Thermal-mechanical analysis of bonding pad in insulated gate bipolar transistor
title_sort thermal-mechanical analysis of bonding pad in insulated gate bipolar transistor
granting_institution Universiti Malaysia Perlis (UniMAP)
granting_department School of Microelectronic Engineering
url http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/77429/1/Page%201-24.pdf
http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/77429/2/Full%20text.pdf
http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/77429/3/Declaration%20Form.pdf
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