Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor
Conventional photolithography usually used in in-house fabrication process to transfer the design of line pattern. This research lays the foundation for the optimization of photo lithography process for line pattern transfer of complex optical circuitry. Integrated Optical Mach-Zehnder Interferomet...
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| 格式: | Thesis |
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| 语言: | English |
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| 在线阅读: | http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/78345/5/Page%201-24.pdf http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/78345/2/Full%20text.pdf http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/78345/3/Nurulbariah.pdf |
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