Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor

Conventional photolithography usually used in in-house fabrication process to transfer the design of line pattern. This research lays the foundation for the optimization of photo lithography process for line pattern transfer of complex optical circuitry. Integrated Optical Mach-Zehnder Interferomet...

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Format: Thesis
Language:English
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Online Access:http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/78345/5/Page%201-24.pdf
http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/78345/2/Full%20text.pdf
http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/78345/3/Nurulbariah.pdf
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