Defectivity improvement in advanced processes and its investigation to negative bias temperature instabilities in High-K/Metal-Gate Deep-Submicron CMOS /

Defectivity improvement in advanced processes and its investigation to negative bias temperature instabilities in High-K/Metal-Gate Deep-Submicron CMOS /

محفوظ في:

التفاصيل البيبلوغرافية
المؤلف الرئيسي:	Yasmin Abdul Wahab (مؤلف)
التنسيق:	أطروحة كتاب
اللغة:	English
منشور في:	2015
الموضوعات:	Metal oxide semiconductors, Complementary > Testing Electroplating chemicals. Integrated circuits > Very large scale integration. Very high speed integrated circuits
الوسوم:	إضافة وسم لا توجد وسوم, كن أول من يضع وسما على هذه التسجيلة!

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