Surface modification of Si, GaAs and and InP by 1-10 keV Ar+ and N2+ ion bombardment /

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Bibliographic Details
Main Author: Pan, Ji Sheng
Format: Thesis Book
Language:English
Published: 1997.
Subjects:
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035 |a ACE-6393 
040 |a UMM 
090 |a QC702.7  |b B65Pan 
100 1 0 |a Pan, Ji Sheng. 
245 1 0 |a Surface modification of Si, GaAs and and InP by 1-10 keV Ar+ and N2+ ion bombardment /  |c Pan Ji Sheng. 
260 |c 1997. 
300 |a xi, 214 leaves :  |b ill. ;  |c 30 cm. 
502 |a Thesis (Ph.D.) -- National University of Singapore, 1997. 
504 |a Includes bibliographical references. 
650 0 |a Ion bombardment. 
650 0 |a Surfaces (Technology) 
650 0 |a Ion implantation. 
948 |a 21/02/1998  |b 25/11/2000 
596 |a 1 
999 |a QC702.7 B65PAN  |w LC  |c 1  |i A507496348  |d 2/9/1998  |l STACKS  |m P01UTAMA  |n 1  |r Y  |s Y  |t TESIS  |u 23/7/1998