A study on the hot-carrier degradation of wide and narrow channel nmosfet devices with recessed-locos isolation structures /
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| 主要作者: | |
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| 格式: | Thesis 圖書 |
| 語言: | English |
| 出版: |
2000.
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| Item Description: | Photocopy. |
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| 實物描述: | xviii, 144 leaves : ill. ; 30 cm. |
| 參考書目: | Bibliography: leaves 137-144. |