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  1. 21
    Quarter-micron process simulation and LDD structure optimization /
    by Wang, Yu
    Published 1997
    Thesis Book
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  2. 22
    Process integration issues of self-aligned titanium silicide technology (Ti-Salicide) in deep sub-micron CMOS devices fabrication /
    by Lim, Chong Wee
    Published 1998
    Thesis Book
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  3. 23
    Enhanced stability of nickel silicide for advanced CMOS silicon technologies /
    by Lee, Pooi See
    Published 2001
    Thesis Book
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  4. 24
    Integration of self-aligned silicide (salicide) process for sub-0.25 [mu]m CMOS technology /
    by Ho, Chaw Sing
    Published 2002
    Thesis Book
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  5. 25
    Gate oxide integrity (GOI) for C13 (0.13 [micro]m) silicon processing technology /
    by Yong, Yoong Hooi
    Published 2006
    Thesis Book
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  6. 26
    Design of a low-voltage RF CMOS low noise amplifier for wireless application /
    Thesis Book
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  7. 27
    Practical design of low power bandgap reference using cmos mixed signal process /
    by Asmah Truky
    Published 2009
    Thesis Book
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  8. 28
    Parameter optimization, characterization and adhesion strength of magnetron sputterred tisin coating /
    by Bushroa Abdul Razak
    Published 2012
    Thesis Book
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  9. 29
    Practical design of CMOS power devices and control with ESD safety in a linear battery charger IC /
    Thesis Book
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